Welcome

The controlled growth of thin films based on metastable materials by chemistry-driven processes is of high technological importance for topics like semiconductor devices or optical coatings. Computational modelling of this inherently multiscale process is crucial for an atomistic understanding and enables a decoupling and separate optimization of the growth-determining factors of non-equilibrium materials. This workshop will result in a joint effort by experts from different modelling communities covering the necessary length and time scales.

The workshop will be held at

Schloss Rauischholzhausen

nearby Marburg in Germany from November 08-11, 2015.

 

Organizers

CECAM   Psi-k   HERALD
   

Sponsors

GRK 1782   ESF Dock/Chemicals